| 铝电解电容器阴极箔的后处理和稳定化处理 |
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| 引用本文： | 邓福祥,田间,阎康平,严季新.铝电解电容器阴极箔的后处理和稳定化处理[J].电子元件与材料,2000,19(4):5-7. |
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| 作者姓名： | 邓福祥 田间 阎康平 严季新 |
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| 作者单位： | 1. 四川大学,四川,成都,610065
2. 南通海星电子有限公司,江苏,通州,226361 |
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| 摘 要： | 研究硝酸后处理对阴极箔比容的影响和稳定化处理形成氧化膜的机理。硝酸浓度和温度低 ,侵蚀箔稳定化处理后氧化膜不稳定 ,容量衰减快。浓度和温度高 ,侵蚀箔容量损失大 ,侵蚀箔的初始比容低。加入硫脲和六偏磷酸钠可提高铝箔的初始比容。磷酸和钼酸钠迭加处理使侵蚀箔获得高的初始比容和低的容量衰减率 ,磷酸处理形成氧化膜可分为 Al PO4结构的表面层及 Al PO4和部分 Al被 P代替的水合氧化铝的过渡层。钼酸钠处理形成的氧化膜可分为 Al2 (Mo O4) 3结构的表面层及 A12 (Mo O4) 3和部分 Al被 Mo代替的水合氧化铝过渡层
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| 关 键 词： | 铝电解电容器 阴极铝箔 化学侵蚀 比容 |
Cleaning and Stabilizing Treatment of Aluminum Foil |
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| DENG Fu-xiang,TIAN Jian,YAN Kang-ping,YAN Ji-xin.Cleaning and Stabilizing Treatment of Aluminum Foil[J].Electronic Components & Materials,2000,19(4):5-7. |
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| Authors: | DENG Fu-xiang TIAN Jian YAN Kang-ping YAN Ji-xin |
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| Affiliation: | DENG Fu xiang 1,TIAN Jian 1,YAN Kang ping 1,YAN Ji xin 2 |
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| Abstract: | In cleaning treatment, when concentration and temperature of nitric acid solution lower, attenuation rate of etched foil capacitance is higher and original capacitance smaller. When temperature rises to 22℃ and concentration 40 g/L, capacitance reaches maximum. When treatment extends 80 seconds, better cleaning effect can be acquired. Etched foil capacitance increase when sulfocarbamide (0 3% by weight) and calgon (0 2% by weight) added. The film formed in phosphoric acid divides into surface layer of AlPO 4 and transition layer of AlPO 4 and hydrated alumina (aluminum partially replaced by phosphor). The film formed in sodium molybdate divides into surface layer of Al 2(MoO 4) 3 and transition layer of Al 2(MoO 4) 3 and hydrated alumina (aluminum partially replaced by molybdenum). (7 refs.) |
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| Keywords: | electrolytic capacitors cathode aluminum foil chemical etching specific capacitance |
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