垂直靶向脉冲激光沉积制备ZnO纳米薄膜

用一种新颖的制备纳米粒子与薄膜的垂直靶向脉冲激光沉积(VTPLD)方法,在室温及空气气氛下,于玻璃基底上成功地制备出ZnO纳米薄膜.用扫描电子显微镜(SEM)和X射线衍射(XRD)仪对ZnO纳米薄膜的表面形貌和结构进行了表征,用荧光光谱仪对薄膜的光致发光(PL)性能进行了测量.结果表明,当激光功率为13 W时,沉积出的粒子大小较均匀,尺寸在40 nm左右,且粒子排列呈现出一定方向性;当激光功率为21 W时,沉积的ZnO纳米薄膜图呈现出微纳米孔的连续薄膜.在玻璃基底上沉积的ZnO纳米薄膜有一主峰对应的(002)衍射晶面,表明ZnO纳米薄膜具有良好的c轴取向性.不同激光功率下沉积ZnO纳米薄膜经500 ℃热处理后的PL峰,其强度随激光能量而变化,最大发光波长位于412 nm.

Preparation of the Znic Oxide Nanometer Thin Films by Vertical Target Pulsed-Laser Deposition

A novel method with vertical pulsed-laser deposition(VTPLD)is proposed to prepare nanoparticle and nanofilm.And ZnO thin films on glass substrates are prepared by VTPLD at room temperature in atmosphere.The surface morphology and structural information of the films are investigated by scanning electron microscopy(SEM)and X-ray diffraction(XRD).The property of photoluminescence of film is also studied.The results show that ZnO nanometer thin film and ZnO microporous continuous thin film are obtained under different laser power of 13 W and 21 W respectively.There is main peak at(002),which shows that the ZnO film has better orientation along c axis.Photoluminescence intensity changes as the function of laser power,and the maximum peak at 412 nm presents blue emission.