精密硅片台步进扫描运动的5阶S曲线规划

为降低硅片台在曝光扫描过程中的加减速时间以及提高扫描速度的平稳性,设计了5阶对称S曲线。设定加速度三阶导数为恒定值,通过向上积分的方法确定了5阶S曲线的位置和速度表达式。以时间最优和冲击最小设计优化指标,对步进过程的5阶轨迹进行优化,设计了改进5阶S曲线。仿真结果表明,5阶S曲线可以使硅片台在短时间内加速到扫描速度,并且可以快速稳定。改进5阶S曲线大幅度缩短步进时间,硅片台步进曲线平滑无突变。

Fifth-order S-curve Trajectory Planning for Step and Scan Operation of Precision Wafer Stage

To reduce the acceleration time and improve the stability of the scanning speed during the exposure process of the wafer stage, a fifth-order S-curve is proposed. The third derivative of the acceleration is designed as a constant, and the position and speed formulas are calculated based on integration method. Optimization index with minimum time and jerk is proposed, and a modified fifth-order S-curve is designed. Simulation results show that the S-cure can ensure that the wafer stage speeds up to the scanning speed quickly and can stabilize in a short time. The modified S-curve can reduce the step time effectively, and the step movement curve is smooth.