| WO3/SnO2复合薄膜的制备及光电性能 |
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| 引用本文： | 刘硕,周龙杰,王贺,王航,李晶晶,黄金亮.WO3/SnO2复合薄膜的制备及光电性能[J].半导体光电,2023,44(4):591-595. |
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| 作者姓名： | 刘硕 周龙杰 王贺 王航 李晶晶 黄金亮 |
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| 作者单位： | 河南科技大学 材料科学与工程学院, 河南 洛阳 471000 |
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| 基金项目： | 高端外国专家项目(GDW2017410125).通信作者:黄金亮 E-mail:huangjl@haust.edu.cn |
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| 摘 要： | 采用水热法和电化学沉积法，成功制备了包覆有SnO2纳米颗粒的WO3纳米棒阵列薄膜，退火处理后形成WO3/SnO2异质结复合薄膜。通过改变SnO2的沉积时间得到了复合薄膜的最佳制备条件。采用XRD,FESEM对WO3/SnO2复合薄膜的物相和形貌进行了分析，通过电化学工作站对WO3/SnO2复合薄膜的光电性能进行了研究，结果表明，电沉积时间为120 s时，WO3/SnO2复合薄膜具有最小的阻抗，且在0.6 V的偏压下光电流密度为0.46 mA/cm2,相比于单一WO3纳米棒薄膜，表现出更好的光电化学性能。
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| 关 键 词： | WO3 SnO2 复合薄膜 电沉积 光电性能 |
| 收稿时间： | 2023/5/10 0:00:00 |
Preparation and Photoelectric Properties of WO3/SnO2 Composite Films |
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| LIU Shuo,ZHOU Longjie,WANG He,WANG Hang,LI Jingjing,HUANG Jinliang.Preparation and Photoelectric Properties of WO3/SnO2 Composite Films[J].Semiconductor Optoelectronics,2023,44(4):591-595. |
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| Authors: | LIU Shuo ZHOU Longjie WANG He WANG Hang LI Jingjing HUANG Jinliang |
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| Affiliation: | School of Materials Science and Engineering, Henan University of Science and Technology, Luoyang 471000, CHN |
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| Abstract: | WO3 nanorods array films coated with SnO2 nanoparticles were prepared by hydrothermal method and electrochemical deposition method, and WO3/SnO2 heterojunction composite films were formed after annealing. The optimum preparation conditions were obtained by changing the deposition time of SnO2. The phase and morphology of WO3/SnO2 composite film were analyzed by XRD and FESEM. The photoelectric properties of WO3/SnO2 composite film were studied by electrochemical workstation. The results show that WO3/SnO2 composite film has the minimum impedance when the deposition time is 120s. And its photocurrent density is 0.46mA/cm2 at a bias voltage of 0.6V, showing better photochemical properties than a single WO3 nanorod film. |
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| Keywords: | WO3 SnO2 composite film electro-deposition photoelectric property |
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