End-pumped Nd:LaF3 and Nd:LaMgAl11O19 lasers |
| |
| Authors: | Fan T.Y. Kokta M.R. |
| |
| Affiliation: | MIT, Lexington, MA; |
| |
| Abstract: | Nd:LaF3 and Nd:LaMgAl11O19 (LMA) are promising candidates for pulsed diode-laser-pumped lasers because they have relatively long upper state lifetimes and large absorption bandwidths compared to other Nd3+ doped materials. Crystal growth of LMA and the spectroscopic properties of both materials are described. Continuous-wave (CW) end-pumped lasers have been demonstrated in these materials using a Ti:Al2O3 laser to simulate the diode-laser pump source. Slope efficiencies of 47% for Nd:LaF3 and 32% for Nd:LMA were obtained. The results for Nd:LaF3 are typical for end-pumped, CW, Nd3+ lasers; the lower slope efficiency for Nd:LMA is attributed to excited-state absorption |
| |
| Keywords: | |
|
|
