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Solution‐based Fabrication of High‐κ Gate Dielectrics for Next‐Generation Metal‐Oxide Semiconductor Transistors |
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| Authors: | Y Aoki T Kunitake |
| Affiliation: | Topochemical Design Laboratory, Frontier Research System, RIKEN, 2–1 Hirosawa, Wako, Saitama 351–0198, Japan |
| Abstract: | |
| Keywords: | Composite materials Sol– gel processes Thin films |