| 紫外激光改性氧化钒薄膜 |
| |
| 引用本文： | 李海鸥,丁志华,潘岭峰,王晓峰,张紫辰.紫外激光改性氧化钒薄膜[J].激光与红外,2017,47(12):1473-1478. |
| |
| 作者姓名： | 李海鸥 丁志华 潘岭峰 王晓峰 张紫辰 |
| |
| 作者单位： | 1.广西精密导航技术与应用重点实验室,桂林电子科技大学,广西 桂林 541004;2.射频电路与系统教育部重点实验室,杭州电子科技大学,浙江 杭州 310018;3.中国科学院微电子研究所,北京 100029 |
| |
| 基金项目： | 国家自然科学基金项目(No.61474031);广西自然科学基金项目(No.2016GXNSFDA380021);桂林市科技开发项目(No.20160216-1);桂林电子科技大学研究生教育创新计划项目(No.2016YJCX15);电子薄膜与集成器件国家重点实验室开放课题(No.KFJJ201604);国家自然科学基金项目(No.51505456);吉林省省级经济结构战略调整引导资金专项基金项目(No.2015Y028);国家自然科学基金项目(No.61376083)资助 |
| |
| 摘 要： | 氧化钒薄膜制备后需要进行退火处理以降低非晶态氧化钒薄膜的方阻大小并改善薄膜结晶特性。传统退火方式时间较长且退火过程会导致器件性能降低。本文主要利用激光精确控制的特点处理氧化钒薄膜,通过平顶光路系统改变激光功率、高斯光斑形貌以及光斑的重叠率对氧化钒薄膜进行退火处理,主要研究了激光能量密度以及光斑重叠率对氧化钒薄膜的方阻,表面粗糙度以及结晶度的影响。实验结果表明激光功率为0.7 W,光斑重叠率为93.33%,光斑能量密度为62.2 mJ/cm2时,退火氧化钒薄膜的方阻值明显降低,薄膜表面光滑且氧化钒结晶度较好。
|
| 关 键 词： | 激光功率 激光重叠率 氧化钒薄膜 激光退火 光束整形 |
Vanadium oxide film modified by UV laser |
| |
| LI Hai-ou,DING Zhi-hu,PAN Ling-feng,WANG Xiao-feng,ZHANG Zi-chen.Vanadium oxide film modified by UV laser[J].Laser & Infrared,2017,47(12):1473-1478. |
| |
| Authors: | LI Hai-ou DING Zhi-hu PAN Ling-feng WANG Xiao-feng ZHANG Zi-chen |
| |
| Affiliation: | 1.Guilin Key Laboratory of Precision Navigation Technology and Application,Guilin University of Electronic Technology,Guilin 541004,China;2.Key Laboratory of RF Circuits and Systems,Ministry of Education,Hangzhou Dianzi University,Hangzhou 310018,China;3.Institute of Microelectronics of Chinese Academy of Sciences,Beijing 100029,China |
| |
| Abstract: | After the preparation of the vanadium oxide thin film,annealing treatment is required to reduce the square resistance of the amorphous vanadium oxide film and improve the film crystallization characteristics.The conventional annealing methods take a long time and the annealing process will lead to the degradation of the device performance.The vanadium oxide thin films by laser precision control is treated by changing the laser power,the Gaussian spot morphology and the overlap rate.The effects of laser energy density and spot overlap rate on the sheet resistance,surface roughness and crystallinity of vanadium oxide thin films were studied.The experimental results show that when the laser power is 0.7 W,the spot overlap rate is 93.33% and the spot energy density is 62.2 mJ/cm2,the sheet resistance of annealed vanadium oxide thin film is obviously reduced,the surface of the film is smooth,and the crystallinity of vanadium oxide is better. |
| |
| Keywords: | laser power laser overlap rate vanadium oxide film laser annealing beam shaping |
|
| 点击此处可从《激光与红外》浏览原始摘要信息 |
|
点击此处可从《激光与红外》下载全文 |
|
