| CuS纳米粒子/分子沉积膜的制备及其摩擦学性能研究 |
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| 引用本文： | 郭岩宝,王德国,张嗣伟.CuS纳米粒子/分子沉积膜的制备及其摩擦学性能研究[J].纳米科技,2009,6(3):49-53. |
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| 作者姓名： | 郭岩宝 王德国 张嗣伟 |
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| 作者单位： | 中国石油大学北京机电工程学院,北京102249 |
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| 基金项目： | 国家自然科学基金（50575151）.国家重大基础研究发展计划（973,2007CB607604）,清华大学摩擦学国家重点实验室开放基金（SKLT05-02） |
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| 摘 要： | 利用分子沉积技术制备了PDDA/PAA分子沉积膜,然后在膜中原位反应生长了CuS纳米粒子,紫外-可见分光光度计、XPS及原子力显微镜（AFM）分析表明,CuS纳米粒子在膜中分布均匀,团聚现象不明显,纳米粒子的粒径随原位反应时间的增加而增加,AFM的力学测试表明,该膜具有良好的减摩抗磨性能。
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| 关 键 词： | 分子沉积膜 原位生长 CuS纳米粒子 |
Research on Preparation and Nanotribological Behavior of CuS Nanoparticle and Molecular Deposition Film |
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| Authors: | GUO Yan-bao WANG De-guo ZHANG Si-wei |
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| Affiliation: | (School of Mechanical and Electronic Engineering, China University of Petroleum, Beijing 102249, China) |
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| Abstract: | PDDA/PAA molecular deposition （MD） films have been prepared by molecular deposition technique, and then CuS nanoparticles grew in the polyelectrolyte MD films in situ. Ultraviolet visible spectroscopy, XPS and atom force distributed proportionately in films and the agglomerate of nanoparticles are inconspicuous. The radius of nanoparticles is increased obviously according the increasing synthesis time. The nanotribological behavior of this MD films have been studied by using AFM, and indicated that the MD films have good nanotribological performance. |
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| Keywords: | molecular deposition （MD） films in situ CuS nanoparticles |
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