| 真空微电子器件中的场致发射阴极硅锥尖的制备工艺研究 |
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| 引用本文： | 唐国洪,陈德英.真空微电子器件中的场致发射阴极硅锥尖的制备工艺研究[J].电子器件,1994,17(3):94-98. |
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| 作者姓名： | 唐国洪 陈德英 |
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| 作者单位： | 东南大学微电子中心 |
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| 摘 要： | 本文介绍了真空微电子器件中的场发射阴极硅锥尖的制作工艺，采用不同的腐蚀方法以及氧化削尖技术，制成了形状较好的硅尖，并对实验研究结果进行了比较、分析和讨论。
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| 关 键 词： | 场发射 硅尖阴极 真空微电子器件 工艺 |
The Investigation of the Fabrication Tehnology of Field Emission Si -Tip Cathode for Vacuums Microeletronic Devices |
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| Yuan,Jing,Tang Guohong,ChenDeying,Zhou Quansheng.The Investigation of the Fabrication Tehnology of Field Emission Si -Tip Cathode for Vacuums Microeletronic Devices[J].Journal of Electron Devices,1994,17(3):94-98. |
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| Authors: | Yuan Jing Tang Guohong ChenDeying Zhou Quansheng |
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| Abstract: | The fabrication technology of field emission si-tip cathodes for vacuum microeletronic devices is described in this paper.Well shaped si-tip array cathods were,obtained by using different etching methods and oxidation sharpening techniques and the photomicrographs are given,The detailed analysis and dixcussion are made on the process techinology. |
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| Keywords: | ield emission si-tip cathode microelectronic devices |
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