Temperature-dependent microtensile testing of thin film materials for application to microelectromechanical system |
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| Authors: | Ming-Tzer Lin Paul El-Deiry Richard R Chromik Nicholas Barbosa Walter L Brown Terry J Delph Richard P Vinci |
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| Affiliation: | 1. Institute of Precision Engineering and Center for Nanoscience and Nanotechnology, National Chung Hsing University, 402, Taichung, Taiwan
2. Materials Science and Mechanical Engineering Department, Lehigh University, Bethlehem, PA, 18015, USA
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| Abstract: | A specially designed microtensile apparatus capable of carrying out a series of tests on microscale thin films for microelectromechanical system (MEMS) applications at room temperature and at temperature up to 400°C has been developed and tested, and is described here. Several MEMS-applicable thin films were measured with it, including thermally grown silicon dioxide, gold, and gold–vanadium. The silicon dioxide was tested at room temperature. Gold and gold–vanadium films were tested at room temperature and at 200 and 400°C. Examples of these results are presented. |
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