Surface structure of high-T c Nb3Ge films

We have studied the surface structure of rf-sputtered Nb₃Ge films by means of reflection electron diffraction and Auger electron spectroscopy. It is found that a tetragonal Nb₅Ge₃ phase exists, being partly disordered, at the surface of high-T_c films, whereas A15 phase is predominant in the body of the film as proved by x-ray diffraction. The tetragonal surface phase is replaced by an amorphous phase in thin films of <1000 Å, where reducedT_c's as compared with those of thick films are found. Single A15 phase occurs at the surface of Ge-deficient films which have lowT_c's. Auger analysis has shown a pronounced Ge-rich layer with a depth of 60–100 Å, depending on film composition and thickness. At the top of the surface layer, Ge is enriched beyond a composition corresponding to Nb₅Ge₃. It is inferred that the Ge-rich layer is responsible for formation of the tetragonal phase.Work supported in part by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture of Japan.