Nonlinear diffusion process modeling using response surface methodology and variable transformation |
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| Authors: | Young-Don Ko Yuhee Kim Dongkwon Park Ilgu Yun |
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| Affiliation: | a Semiconductor Engineering Laboratory, Department of Electrical and Electronic Engineering, Yonsei University, 134 Shinchon-Dong, Seodaemun-Gu, Seoul 120-749, South Korea;b Department of Applied Statistics, Yonsei University, 134 Shinchon-Dong, Seodaemun-Gu, Seoul 120-749, South Korea;c Department of Information and Statistics, Yonsei University, Wonju 220-710, South Korea |
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| Abstract: | The nonlinear process modeling is investigated using statistical design method and response surface methodology. Three input factors are examined with respect to the response factor. In order to minimize the joint confidence region of fabrication process with varying conditions, D-optimal experimental design technique is performed and diffusion rate is characterized by response model. Then, the statistical results are used to verify the fitness of the nonlinear process model. Based on the results, this modeling methodology can be optimized process condition for semiconductor manufacturing. |
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| Keywords: | Author Keywords: Process modeling D-optimal design Response surface methodology Variable transformation |
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