| 化学镀非晶态Ni—B合金的研究 |
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| 引用本文： | 胡石林,刘利辉.化学镀非晶态Ni—B合金的研究[J].核化学与放射化学,1989,11(3):183-188. |
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| 作者姓名： | 胡石林 刘利辉 |
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| 作者单位： | 中国原子能科学研究院 北京
(胡石林)，湘西仪器研究所 湖南(刘利辉) |
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| 摘 要： | 本文通过化学镀方法在铜和钢上沉积非晶态Ni-B合金。着重讨论了还原剂浓度、络合剂浓度对化学镀沉积速率的影响;分析了它的耐蚀原因和其显微硬度随退火温度的变化情况并就其应用和发展略作说明。
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| 关 键 词： | 化学镀 非晶态 Ni－B合金 |
ELECTROLESS DEPOSITION OF AMORPHOUS NICKEL-BORON ALLOY |
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| HU SHILIN LIU LIFEI.ELECTROLESS DEPOSITION OF AMORPHOUS NICKEL-BORON ALLOY[J].Journal of Nuclear and Radiochemistry,1989,11(3):183-188. |
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| Authors: | HU SHILIN LIU LIFEI |
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| Abstract: | In this paper, a process for the electroless deposition of amorphous nickel -boron alloy is described, and the effect of the concentration of the reducing agen-t and the complex agent on the rate of the electroless deposit is studied. Tine alloy hindrance-corrosion is analysed, and the alloy hardness at various annealing temperatures is discussed. |
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| Keywords: | Hindrance-corrosion Hardness Eleotroless deposition Amorphous nickel-boron alloy |
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