|
|||||
|
|
| 超净高纯试剂与紫外光刻胶 | |
| 引用本文： | 孙世铭. 超净高纯试剂与紫外光刻胶[J]. 精细与专用化学品, 1999, 7(10): 8-10 |
| 作者姓名： | 孙世铭 |
| 作者单位： | 北京化学试剂研究所 副所长 |
| 摘 要： | 超净高纯试剂和紫外光刻胶作为IC生产工艺中的关键材料,随着IC生产向亚微米和深亚微米方向发展,对他们提出了新的要求。 |
| 关 键 词： | 超净高纯试剂 紫外光刻胶 电子化学品 |
PROCESS CHEMICALS AND UV PHOTORESIST. |
|
| SunShiming. PROCESS CHEMICALS AND UV PHOTORESIST.[J]. Fine and Specialty Chemicals, 1999, 7(10): 8-10 | |
| Authors: | SunShiming |
| Abstract: | As key materials in IC production process, process chemicals and photoresists are expected to meet new demands with t he development of IC towards sub - micrometer and deep sub -micrometer. |
| Keywords: | electronic chemicals process chemicals phototresist |
| 本文献已被 CNKI 维普 等数据库收录！ | |