| 射频磁控溅射钛镀层与陶瓷界面的X射线光电子能谱研究 |
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| 引用本文： | 张汉林,袁润章.射频磁控溅射钛镀层与陶瓷界面的X射线光电子能谱研究[J].复合材料学报,1997,14(2):41-44. |
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| 作者姓名： | 张汉林 袁润章 |
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| 作者单位： | [1]武汉工业大学材料复合新技术国家重点实验室 [2]中国科学院武汉物理所 |
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| 摘 要： | 本文采用XPS配合Ar+离子原位刻蚀研究了用射频磁控溅射法制备Ti/Al2O3(0001),Ti/Al2O3(多晶)和Ti/MgO(001)体系的界面结构。结果表明,在Ti/Al2O3体系的界面处存在Al3+的还原态和Ti的氧化态,且在刻蚀过程中,Al3+的还原态出现在Ti的氧化态之前。用相同方法制备的Ti/MgO界面没有产生类似的界面反应。
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| 关 键 词： | 钛镀层 氧化铝 氧化镁 X射线光电子能谱 |
| 收稿时间： | 1996-01-25 |
| 修稿时间： | 1996-05-27 |
XPS STUDY ON THE INTERFACIAL STRUCTURE OF RF MAGNETRON SPUTTERED TITANIUM COATINGS AND CERAMICS |
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| Zhang Hanlin,Liu Hanxing,Wang Dianfen,Ouyang Shixi,Yuan Runzhang.XPS STUDY ON THE INTERFACIAL STRUCTURE OF RF MAGNETRON SPUTTERED TITANIUM COATINGS AND CERAMICS[J].Acta Materiae Compositae Sinica,1997,14(2):41-44. |
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| Authors: | Zhang Hanlin Liu Hanxing Wang Dianfen Ouyang Shixi Yuan Runzhang |
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| Affiliation: | 1. Wuhan University of Technology, Wuhan 430070;2. Wuhan Institute of Physics, Chinese Academy of Science, Wuhan 430071 |
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| Abstract: | The interfacial structure of Ti/single crystal Al 2O 3(0001), Ti/polycrystalline Al 2O 3, and Ti/single crystal MgO(001)system made by RF magnetron sputtering was investigated by using XPS combining with Ar + ion in situ etching in this paper. The results show that the reduction of Al 3+ and oxidation of titanium exist at the interface of Ti/Al 2O 3 systems. Moreover, the reduced Al appears before the oxided Ti at the interface of Ti/Al 2O 3 in the etching process. No similar interfacial reaction was observed at the interface of Ti/MgO system by the same making method. |
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| Keywords: | titanium coating alumina magnesia X ray photoelectron spectroscopy |
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