Rückseitenmetallisierung Wafer‐basierter Si‐Solarzellen mittels EB‐PVD

Back Side Metallization of Wafer Based Silicon Solar Cells by Means of Electron Beam Evaporation Electron beam evaporation is an innovative vacuum deposition technology regarding the wafer backside metallization of crystalline silicon solar cells. The motivation for the consideration of electron beam evaporation as cell finishing step is based on the one hand on the competition with thin film photovoltaic modules and on the other on the remarkable cost reduction potential by applying EB‐PVD (Electron Beam Physical Vapor Deposition). This article presents a highly productive coater concept and gives an explanation of important aspects for the adaption of the coater concept to typical solar cell features. Various PVD technologies are compared concerning their possible use as wafer backside metallization method. Challenges and chances of the introduction of EB‐PVD in the wafer based solar cell production are considered.