蒸发材料用高纯金的制备研究

采用盐酸+氯酸钠溶解-沉淀除杂-选择性液相还原-煮洗等联合工艺制备蒸发材料用高纯金并进行应用性能分析。结果表明,溶解后的金溶液采用氢氧化钠调整溶液pH值去除部分杂质元素;金溶液采用还原剂选择性还原;得到的金粉用稀硝酸、盐酸煮洗,获得纯度99.999%以上,碳和硫含量均小于1×10~(-6)的高纯金;以制备的高纯金为原料加工的蒸发材料清洁性好,可作为集成电路芯片制造用蒸发材料。

Study on preparation of high-purity gold for evaporation materials

The combined process of hydrochloric acid and sodium chlorate dissolution-removal of impurities by precipitation-selective liquid phase reduction-boiling washing was used to directly prepare high-purity gold for evaporation materials, and its application performance was analyzed. The preparation process details were as follows: the pH value of the gold solution was first adjusted by sodium hydroxide solution to remove some impurities; then the obtained gold solution was selectively reduced, and the resulted gold powder was further boiled in dilute nitric acid and hydrochloric acid, respectively, and high pure gold with purity of over 99.999% was obtained and the contents ofboth carbon and sulfur were less than 1×10^-6. The prepared high-purity gold havegood clean performance, which can be used as the evaporation material for integrated circuit chips manufacturing.