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A Comprehensive Investigation of Vertically Stacked Silicon Nanosheet Field Effect Transistors: an Analog/RF Perspective |
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| Authors: | Tayal Shubham Ajayan J Joseph L M I Leo Tarunkumar J Nirmal D Jena Biswajit Nandi Ashutosh |
| Affiliation: | 1.SR University, Warangal, Telangana, India ;2.Karunya Institute of Technology and Sciences, Coimbatore, Tamilnadu, India ;3.Koneru Lakshmaiah Education Foundation, Vaddeswaram, AP, India ;4.NIT Kurukshetra, Kurukshetra, Haryana, India ; |
| Abstract: | Silicon - In this article, the analog/RF performance of n-channel vertically stacked gate all around (GAA) silicon nanosheet field effect transistors (Si-NSFETs) are investigated using 3-D TCAD... |
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