Performance Improvement of Double-Gate TFET Using Metal Strip Technique |
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| Authors: | Kumar Satyendra Nigam Kaushal Chaturvedi Saurabh Khan Areeb Inshad Jain Ashika |
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| Affiliation: | 1.Department of Electronics and Communication Engineering, Jaypee Institute of Information Technology, Noida, India
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| Abstract: | Silicon - In order to overcome the limitations of a tunnel field-effect transistor (TFET) and to enhance its performance, the use of a low work function live strip (LWLS) in a conventional... |
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