| 高反膜的计算机模拟及对实践的指导意义 |
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| 引用本文： | 舒雄文,田增霞,徐晨,沈光地.高反膜的计算机模拟及对实践的指导意义[J].光电工程,2006,33(11):142-144. |
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| 作者姓名： | 舒雄文 田增霞 徐晨 沈光地 |
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| 作者单位： | 北京工业大学,电子信息与控制工程学院,北京市光电子技术实验室,北京,100022 |
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| 基金项目： | 国家重点基础研究发展计划(973计划);北京市教委科研项目 |
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| 摘 要： | 本文利用计算机对多层介质高反膜反射谱的模拟发现,当构成高反膜系的高、低两种折射率材料的光学厚度不一致时,反射带两侧的第一个谷值的大小将不同,据此作者认为在高反膜镀制时可根据反射带两侧第一个谷值大小情况来调节高反膜中单层膜厚度,实验结果证明了模拟结果的正确性,同时也确证了作者提出的这种方法是可行的。
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| 关 键 词： | 高反膜 四分之一波长 光学厚度 物理厚度 |
| 文章编号： | 1003-501X(2006)11-0142-03 |
| 收稿时间： | 2006-04-01 |
| 修稿时间： | 2006-07-10 |
Computer simulation of high-reflection films and its application to practice |
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| SHU Xiong-wen,TIAN Zeng-xia,XU Chen,SHEN Guang-di.Computer simulation of high-reflection films and its application to practice[J].Opto-Electronic Engineering,2006,33(11):142-144. |
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| Authors: | SHU Xiong-wen TIAN Zeng-xia XU Chen SHEN Guang-di |
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| Abstract: | A novel method of adjusting the thickness of the single layer of high and low index materials was put forward according to the computer simulation, which show that the values of the valleys nearest to the reflection band were different when the optical thicknesses of the high and low index materials were different. The experiment results verified the validity of the simulation and confirmed the feasibility of the method. |
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| Keywords: | High-reflection films One quarter wavelength Optical thickness Physical thickness |
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