|
|||||
|
|
| 紫外激光刻蚀氧化锆陶瓷初步研究 | |
| 引用本文： | 凌磊,楼祺洪,叶震寰,董景星,魏运荣. 紫外激光刻蚀氧化锆陶瓷初步研究[J]. 应用激光, 2002, 22(4): 405-408 |
| 作者姓名： | 凌磊 楼祺洪 叶震寰 董景星 魏运荣 |
| 作者单位： | 中国科学院上海光学与精密机械研究所,上海,201800 |
| 摘 要： | 描述了KrF准分子激光对氧化锆陶瓷的微刻蚀实验,研究了脉冲刻蚀深度与脉冲数的关系(刻蚀速率),刻蚀的槽的形貌,并进行了刻蚀小孔的初步研究,得到直径为40μm,深度为25μm的微孔矩阵。为KrF激光对该材料的加工提供实验数据。 |
| 关 键 词： | 准分子激光 刻蚀 氧化锆陶瓷 |
Etching of ZrO2 ceramic with UV laser ablation |
|
| Ling Lei,Ye Zhenghuan,Dong Jingzxing,Wei Yunrong,Lou Qihong. Etching of ZrO2 ceramic with UV laser ablation[J]. Applied Laser, 2002, 22(4): 405-408 | |
| Authors: | Ling Lei Ye Zhenghuan Dong Jingzxing Wei Yunrong Lou Qihong |
| Affiliation: | Shanghai Institute of Optics and Fing Mechanics Shanghai 201800 |
| Abstract: | The experiment of micro-ablation of ZiO_2 ceramic by KrF excimer laser is described in this paper. The relationship between etching depth and laser pulse number, and the morphology of etching groove are investigated. The micro-holes with 40(m diameter and 25(m deepness are obtained. The results give the fundamental data for KrF laser ceramic processing. |
| Keywords: | excimer laser ablation ZrO2 ceramic |
| 本文献已被 CNKI 万方数据 等数据库收录！ | |