| 自适应非均匀性校正中鬼影问题的分析 |
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| 引用本文： | 刘会通,马红伟. 自适应非均匀性校正中鬼影问题的分析[J]. 红外技术, 2003, 25(5): 30-32,36 |
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| 作者姓名： | 刘会通 马红伟 |
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| 作者单位： | 华中科技大学光电子工程系,武汉,430074;洛阳光电技术发展中心,洛阳,471009 |
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| 摘 要： | 论述了红外焦平面阵列自适应非均匀校正中的“鬼影”问题;以实际图像序列对目前现有的方法进行了实验测试,表明其实际作用有限,而且影响非均匀性的校正效果;提出了三种新的改进和设想,并分析了存在的不足。鬼影问题的有效解决必须基于来自新概念的创新性算法技巧。
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| 关 键 词： | 红外焦平面阵列 非均匀性校正 伪像 |
| 文章编号： | 1001-8891(2003)05-0030-03 |
An Analysis of the Ghosting Artifact in Adaptive Nonuniformity Correction |
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| LIU Hui-tong ,MA Hong-wei. An Analysis of the Ghosting Artifact in Adaptive Nonuniformity Correction[J]. Infrared Technology, 2003, 25(5): 30-32,36 |
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| Authors: | LIU Hui-tong MA Hong-wei |
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| Affiliation: | LIU Hui-tong 1,MA Hong-wei 2 |
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| Abstract: | Problem of ghosting artifact in adaptive nonuniformity correction for infrared FPA was a nalyzed. Experiments with practical image sequences indicated that the effects of current method to minimize the ghosting artifacts was limited and would be inalid to some extent. Three improvements and ideas were proposed and their feasibilities were analyzed. Solution of problems have to create algorithms and skills based on new concepts to effectively minimize this problem. |
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| Keywords: | IRFPA nonuniformity correction artifacts |
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