Moisture resistance of SU-8 and KMPR as structural material |
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| Authors: | VM Blanco Carballo J Melai C Salm J Schmitz |
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| Affiliation: | 1. The University of Queensland, National Research Centre for Environmental Toxicology (Entox), 39 Kessels Road, Coopers Plains, QLD, 4108, Australia;2. UFZ – Helmholtz Centre for Environmental Research, Permoserstraβe 15, 04318, Leipzig, Germany;3. Eberhard Karls University Tübingen, Center for Applied Geosciences, Environmental Toxicology, Germany;4. Griffith University, School of Environment, 170 Kessels Road, Nathan, QLD, 4111, Australia;1. Teaching and Research Section of Physics, Chengdu Medical College, Chengdu 610083, PR China;2. Teaching and Research Section of Chemistry, Chengdu Medical College, Chengdu 610083, PR China;1. Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland;2. School of Chemistry, Trinity College Dublin, Dublin 2, Ireland |
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| Abstract: | This paper treats the moisture resistance of SU-8 and KMPR, two photoresists considered as structural material in microsystems. Our experiments focus on the moisture resistance of newly developed radiation imaging detectors containing these resists. Since these microsystems will be used unpackaged, they are susceptible to all kinds of environmental conditions. Already after 1 day of exposure to a humid condition the structural integrity and adhesion of SU-8 structures, measured by a shear test is drastically reduced. KMPR photoresist shows much stronger moisture resistance properties, making it a suitable alternative in our application. |
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