| 激光作用下GeS2非晶半导体薄膜的性能及结构变化 |
| |
| 引用本文： | 刘启明,干福熹,顾冬红.激光作用下GeS2非晶半导体薄膜的性能及结构变化[J].无机材料学报,2002,17(4):805-810. |
| |
| 作者姓名： | 刘启明 干福熹 顾冬红 |
| |
| 作者单位： | 中国科学院上海光学精密机械研究所，上海201800 |
| |
| 摘 要： | 采用514.5nm波长的氩离子激光器，结合X射线衍射分析（XRD）、红外光谱分析（IR）、扫描电镜分析（SEM）和透射光谱分析，研究了GeS2非晶半导体薄膜在激光辐照后的性能及结构变化。实验结果发现，经热处理和激光辐照后，薄膜的光学吸收边均移向短波长处，并且随着辐照激光强度和辐照时间的增加而增加，这种平移在退火薄膜中是可逆的。SEM结果分析表明，薄膜在激光辐照后有晶相出现，且随着辐照激光强度的增加，晶相更多。
|
| 关 键 词： | 激光辐照 GeS2 非晶半导体薄膜 性能 结构 氩离子 光致变化 硫化锗 |
| 文章编号： | 1000-324X(2002)04-0805-06 |
| 收稿时间： | 2001-7-2 |
| 修稿时间： | 2001年7月2日 |
Changes of Properties and Structure in Amorphous GeS2 Films by Laser Illumination |
| |
| LIU Qi-Ming,GAN Fu-Xi,GU Dong-Hong.Changes of Properties and Structure in Amorphous GeS2 Films by Laser Illumination[J].Journal of Inorganic Materials,2002,17(4):805-810. |
| |
| Authors: | LIU Qi-Ming GAN Fu-Xi GU Dong-Hong |
| |
| Affiliation: | ShanghaiInstituteofOpticsandFineMechanics;ChineseAcademyofSciences;Shanghai201800;China |
| |
| Abstract: | The changes of properties and structure in GeS2 amorphous semiconductor films by light illumination from Ar ion laser were studied with the XRD, IR, SEM and transmission spectra analysises. Photoinduced crystallization was also observed in the exposed films. The results show that the optical absorption edges of the films shift to shorter wavelength according to annealing and light illumination. The magnitude of shift increases with the increase of the intensity of illumination light and the illumination time, and the shift in annealed films is reversible. |
| |
| Keywords: | amorphous GeS2 film ar ion laser illumination photoinduced change |
| 本文献已被 CNKI 维普 等数据库收录！ |
| 点击此处可从《无机材料学报》浏览原始摘要信息 |
|
点击此处可从《无机材料学报》下载全文 |
