High-Temperature Stability of Alumina in Argon and Argon/Water-Vapor Environments |
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| Authors: | Weon-Pil Tai Tadahiko Watanabe Nathan S Jacobson |
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| Affiliation: | Department of Inorganic Composite Materials, Kyushu National Industrial Research Institute, Tosu, Saga 841, Japan;NASA Lewis Research Center, Cleveland, Ohio 44135 |
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| Abstract: | The high-temperature stability of alumina (Al2O3) in argon and argon/water-vapor (Ar/H2O) environments has been investigated. Samples were exposed at temperatures of 1300°C–1700°C for 10 h. The microstructure, flexural strength, and volume all showed significant changes in the Ar/H2O environment at 1700°C. Samples also became whiter, because of the oxidation of graphite impurities that had diffused from the hot-processing dies. In the Ar/H2O environment at 1700°C, grain-boundary etching occurred and was much more severe than in the pure-argon environment, which was very likely caused by the enhanced formation of gaseous Al(OH)3 and Al(OH)2 along grain boundaries. In addition, in the Ar/H2O environment, substantial grain growth occurred in the surface vicinity. This grain growth, together with grain-boundary etching, led to a decrease in flexural strength. |
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