六偏磷酸钠对磁性复合流体分散性及光学玻璃抛光性能的影响

为了提高磁性复合流体(Magnetic Compound Fluid,MCF)的抛光性能,通过实验调查无机电解质分散剂六偏磷酸钠(Sodium Hexametaphosphate,SHMP)对MCF颗粒团聚的影响,研究MCF抛光液颗粒分散性与BK7光学玻璃抛光材料去除率和表面粗糙度的变化关系。在MCF中添加不同质量分数的SHMP,测试MCF中颗粒的粒径分布和中值粒径D50的变化,并采用扫描电镜观察MCF中颗粒分散性;利用不同含量SHMP的MCF对BK7光学玻璃进行抛光加工,研究SHMP含量变化对光学玻璃抛光材料去除率和表面粗糙度的影响规律。实验表明,在MCF中添加适量SHMP能够减少抛光液颗粒的团聚,提高MCF抛光液的颗粒分散性,改善BK7光学玻璃的材料去除率和表面质量。当SHMP质量分数为3%时,中值粒径D50达到最小值7.023μm,并且MCF抛光液的分散性最佳,材料去除率达到最大值22.6×10^-4 g/min,表面粗糙度达到最小值15.78 nm。

Effect of Sodium Hexametaphosphate on the Dispersion of Magnetic Compound Fluid and Its Polishing Performance for Optical Glass

To improve the polishing performance of magnetic compound fluid(MCF), the effect of sodium hexametaphosphate(SHMP) which is an inorganic electrolyte dispersant, on the agglomeration of MCF polishing liquid particles was investigated. The relationship between the dispersion of MCF polishing liquid particles, the removal rate and surface roughness of BK7 optical glass polishing material was studied. The changes of particle size distribution and median particle size D50 were measured in MCF by adding SHMP with different mass fraction, and the dispersion of MCF particles was observed by scanning electron microscope. BK7 optical glass was polished by MCF with different percentage of SHMP. The effect of SHMP percentage was studied on the material removal rate and surface roughness of optical glass during polishing. The experimental results show that the proper amount of SHMP in MCF can reduce the agglomeration of polishing liquid particles, improve the dispersion of MCF polishing liquid particles, and improve the material removal rate and surface quality of BK7 optical glass. When the mass fraction of SHMP is 3%, the median particle size D50 is 7.023 μm, the dispersion of MCF particles is better, relatively. The material removal rate is 22.6×10^-4 g/min, and the surface roughness is 15.78 nm.