An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/ oxygen plasmas |
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| Authors: | M R Alexander R D Short F R Jones M Stollenwerk J Zabold W Michaeli |
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| Affiliation: | (1) Laboratory for Surface and Interface Analysis, Department of Engineering Materials, University of Sheffield, Sir Robert Hadfield Building, Mappin Street, P.O. Box 600, S1 4 DU Sheffield, UK;(2) Institut Für Kunststoffverarbeitung, RWTH Aachen, D-52056 Aachen, Germany |
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| Abstract: | The effect of oxygen addition to microwave-sustained plasmas of hexamethyldisiloxane (HMDSO) has been investigated. Attention was directed to the solid products formed on aluminium substrates (plasma deposits). To enable a quantitative analysis of these, X-ray photoelectron spectroscopy (XPS) of standard silicon-containing materials was carried out. When suitable charge correction is applied to the XP spectra of HMDSO/O2 plasma deposits, a number of very clear trends emerge. From changes in elemental composition, core line binding energies (Si2p, C 1s, and O 1s) and widths, we show how oxygen addition to the plasma affects the chemical nature of the plasma deposit. The data reported also provide (some limited) information on the reactions taking place in the plasma. |
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