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Nonlinear iterative learning control with applications to lithographic machinery
Authors:Marcel Heertjes  Tim Tso  
Affiliation:

aPhilips Applied Technologies, Mechatronics Technologies, 5656 AE Eindhoven, The Netherlands

bEindhoven University of Technology, Faculty of Mechanical Engineering, Dynamics and Control Technology, 5600 MD Eindhoven, The Netherlands

cASML, Mechatronic Systems Development, 5504 DR Veldhoven, The Netherlands

Abstract:An experimental demonstration is given of (nonlinear) iterative learning control applied to a reticle stage of a lithographic wafer scanner. To limit the presence of noise in the learned forces, a nonlinear amplitude-dependent learning gain is proposed. With this gain, high-amplitude signal contents is separated from low-amplitude noise, the former being compensated by the learning algorithm. Contrary to the underlying linear design, the continuously varying trade-off between high-gain convergence rates and low-gain noise transmission demonstrates a significant improvement of the nonlinear design in achieving performance.
Keywords:Iterative learning control   Feedforward control   Lifted system approach   Lithographic machinery   Lyapunov theory   Nonlinear control
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