Cathodoluminescence of the a-C:N films deposited by a filtered cathodic arc plasma system |
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| Affiliation: | 1. Department for Ion Beam Technologies, GNS Science, 30 Gracefield Road, Lower Hutt, New Zealand;2. The MacDiarmid Institute for Advanced Materials and Nanotechnology, New Zealand;3. Department of Chemical and Materials Engineering, The University of Auckland, New Zealand;4. Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, Germany;1. Institute of Applied Physics and Mathematics, University of Pardubice, Studentska 95, 53210 Pardubice, Czech Republic;2. Institute of Physics, Academy of Sciences of the Czech Republic, v.v.i., Prague 8, Czech Republic;3. IMOMEC Division, IMEC, Institute for Materials Research, University Hasselt, Wetenschapspark 1, B3590, Belgium |
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| Abstract: | ![]()
Amorphous carbon nitride (a-C:N) films were successfully synthesized on silicon using a 90°-bend magnetic filtered cathodic arc plasma (FCAP) system. ESCA analysis demonstrated that the N/C ratios reached 1.08. Many investigations on photoluminescence (PL) spectra of diamondlike carbon films have been performed, but cathodoluminescence (CL) spectra have seldom been discussed. This work investigated a-C:N films using the CL spectra at 300 K. This work presents CL spectra of a-C:N films obtained at 1.5–3.5 eV and verifies luminescence from the a-C:N films in the visible region. The most prominent luminescence in the CL spectra from the a-C:N films has two peaks centered ∼2.67 eV (blue light) and ∼1.91 eV (red light), but the a-C film yielded only the band at ∼1.91 eV. These optical emissions are intrinsic and extrinsic to the a-C:N film and are sensitive to the content of nitrogen. |
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