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Recent progress in GeSi electro-absorption modulators
Authors:Papichaya Chaisakul  Mohamed-Said Rouifed  Jacopo Frigerio  Daniel Chrastina  Jean-René Coudevylle
Affiliation:1. Institut d’Electronique Fondamentale, Université Paris-Sud, CNRS UMR 8622, Bat. 220, F-91405 Orsay Cedex, France;2. L-NESS, Dipartimento di Fisica del Politecnico di Milano, Polo di Como, Via Anzani 42, I-22100 Como, Italy
Abstract:Electro-absorption from GeSi heterostructures is receiving growing attention as a high performance optical modulator for short distance optical interconnects. Ge incorporation with Si allows strong modulation mechanism using the Franz–Keldysh effect and the quantum-confined Stark effect from bulk and quantum well structures at telecommunication wavelengths. In this review, we discuss the current state of knowledge and the on-going challenges concerning the development of high performance GeSi electro-absorption modulators. We also provide feasible future prospects concerning this research topic.
Keywords:Electro-absorption  Franz–Keldysh effect  Quantum-confined Stark effect  GeSi  Multiple quantum wells  Optical modulator
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