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Studies of aluminum oxide thin films deposited by laser ablation technique
Affiliation:1. Institute of Physics, Faculty of Physics, Astronomy and Informatics, Nicolaus Copernicus University, Grudziądzka 5, PL 87-100 Toruń, Poland;2. LUNAM Université, Université d’Angers, CNRS UMR 6200, Laboratoire MOLTECH-Anjou, 2 Bd Lavoisier, 49045 Angers Cedex, France;1. Chair of Solid State Physics, Ivan Franko National University of Lviv, Drahomanova Str. 50, Lviv 79005, Ukraine;2. Scientific-Technical and Educational Center of Low Temperature Studies, Drahomanova Str. 50, Lviv 79005, Ukraine;1. V. Lashkaryov Institute of Semiconductor Physics of the National Academy of Sciences of Ukraine, 41 Nauky Pr., 03028 Kyiv, Ukraine;2. L. Pysarzhevskiy Institute of Physical Chemistry of the National Academy of Sciences of Ukraine, 31 Nauky Pr., 03028 Kyiv, Ukraine;3. Elma-Malachite JSC, 124460 Zelenograd, Russia;1. College of Electronics & Information Engineering, Sichuan University, Chengdu 610064, China;2. Fine Optical Engineering Research Center, Chengdu 610041, China;3. Southwest Institute of Technical Physics, Chengdu 610041, China;1. Cracow University of Technology, Faculty of Mechanical Engineering M2, Al. Jana Pawla II 37, 31-864 Cracow, Poland;2. Elkom Trade S.A., Targowa 21 Street, 27-400 Ostrowiec Swietokrzyski, Poland;3. Henryk Niewodniczanski Institute of Nuclear Physics Polish Academy of Sciences, Radzikowskiego Str.152, 31-342 Cracow, Poland;4. Institute of Physics, Cracow University of Technology, Podchorazych 1 Street, 30-084 Cracow, Poland;5. AGH University of Science and Technology, Mickiewicza av.30, 30-059 Cracow, Poland;6. Electrical Engineering Department, Faculty of Science and Technology Mohammedia, University Hassan II of Casablanca, Morocco;1. Laboratoire MOLTECH Anjou, Université d’Angers, UFR Sciences, UMR 6200, CNRS, Bât. K, 2 Bd. Lavoisier, 49045 Angers Cedex, France;2. Laboratoire de Physico-chimie de l’état solide, Université de Sfax, Route de Soukra, Km 4, BP: 802, 3038 Sfax, Tunisia;3. Institute of Physics, Faculty of Mathematics and Natural Science, Jan Dlugosz University in Czestochowa, Al. Armii Krajowej 13/15, 42-200 Czestochowa, Poland;1. School of Physics, University of the Witwatersrand, Johannesburg, South Africa;2. Materials for Energy Research Group, University of the Witwatersrand, Johannesburg, South Africa;3. DST–NRF Centre of Excellence in Strong Materials, University of the Witwatersrand, Johannesburg, South Africa
Abstract:This paper presents the structural and optical investigations of the aluminum oxide nanocrystalline thin films. Investigated films were fabricated by laser ablation technique in high vacuum onto quartz substrates. The films were deposited at two different temperatures of the substrates equal to room temperature and 900 K. X-ray Diffraction spectra proved nanocrystalline character and the corundum phase of the film regardless on the substrate temperature during the deposition process. Values of the refractive indices, extinction and absorption coefficients were calculated by using Transmission and Reflection Spectroscopy in the UV–VIS–NIR range of the wavelength. Coupling Prism Method was used for films thickness estimations. Experimental measurements and theoretical calculations of the Third Harmonic Generation were also reported. Obtained results show that the lattice strain may affect obtained values of the third order nonlinear optical susceptibility.
Keywords:Aluminum oxide  Laser ablation  Time-of-flight mass spectrometry  Transmission and Reflection Spectroscopy  Coupled prism method  Third Harmonic Generation
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