Characterization of high-quality polycrystalline diamond and its high FET performance |
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Authors: | K. Ueda M. Kasu Y. Yamauchi T. Makimoto M. Schwitters D.J. Twitchen G.A. Scarsbrook S.E. Coe |
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Affiliation: | aNTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, 243-0198, Japan;bElement Six Ltd., King's Ride Park, Ascot, Berkshire SL5 8BP, UK |
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Abstract: | We characterized high-quality polycrystalline diamond with large grains and fabricated polycrystalline diamond field effect transistors (FETs). The polycrystalline diamond had (110) preferred orientation, and its typical grain size was 100 μm. Well-resolved free exciton related emissions were observed at room temperature in cathodoluminescence. The FETs showed extremely high DC and RF performance. The cut-off frequency for current gain (fT) and power gain (fmax) were 45 and 120 GHz, respectively. The maximum drain current (IDS) was 550 mA/mm. These values are the highest among diamond FETs, including those fabricated from single-crystal diamond. These results suggest that high-quality polycrystalline diamond, whose maximum size is 4 in., is very promising for diamond electronic devices. |
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Keywords: | Polycrystalline diamond FET RF performance Hydrogen-terminated |
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