首页 | 本学科首页   官方微博 | 高级检索  
     


Nanoimprint patterning for tunable light trapping in large-area silicon solar cells
Authors:Aleksander Bessonov  Youngtae ChoSeung-Jae Jung  Eun-Ah ParkEun-Soo Hwang  Jong-Woo LeeMyunghun Shin  Sukwon Lee
Affiliation:a Patterning Group, Manufacturing Technology Center, Samsung Electronics Co. Ltd., 416 Maetan-3 Dong, Yeongtong-Gu, Suwon, Gyeonggi-Do 443-742, South Korea
b Solar Energy Business Team, Samsung Electronics Co. Ltd., San 24 Nongseo-Dong, Kiheung-Gu, Yongin, Gyeonggi-Do 449-711, South Korea
Abstract:We demonstrate the flexibility of UV nanoimprint lithography for effective light trapping in p-i-n a-Si:H/μc-Si:H tandem solar cells. A textured polymeric layer covered with pyramidal transparent conductive oxide structures is shown as an ideal system to promote front light scattering and thus enhanced photocurrent. The double structure incorporated into micromorph tandem thin film silicon solar cells is systematically investigated in order to find a relationship between interface morphology, optical properties and photovoltaic characteristics. To prevent the formation of defects during cell growth, a controllable smoothing of the imprinted texture is developed. Modules grown on polymer structures smoothed via multi-replication show excellent performance reaching a photocurrent of 12.6 mA/cm2 and an efficiency of 12.8%.
Keywords:Thin film solar cells   Light scattering   UV nanoimprint lithography   Pattern fidelity   Texture smoothing   Double texture
本文献已被 ScienceDirect 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号