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Microstructure and Mechanical Properties of CrN Films Deposited by Inductively Coupled Plasma Enhanced Radio Frequency Magnetron Sputtering |
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| Authors: | LIU Feng MENG Yuedong REN Zhaoxing SHU Xingsheng |
| Affiliation: | Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China |
| Abstract: | inductively coupled plasma （ICP）, RF magnetron sputtering, CrN, microstructure, nanohardness, stress |
| Keywords: | inductively coupled plasma （ICP） RF magnetron sputtering CrN microstructure nanohardness stress |
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