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化学气相沉积法制备金刚石薄膜的工业应用
引用本文:马志斌,邬钦崇,汪建华.化学气相沉积法制备金刚石薄膜的工业应用[J].材料导报,2001,15(3):24-27.
作者姓名:马志斌  邬钦崇  汪建华
作者单位:1. 中国科学院等离子体物理研究所,
2. 武汉化工学院材料工程系
摘    要:评述了金刚石薄膜的化学气相沉积方法,介绍了金刚石薄膜在工业中的应用前景,并分析了大规模应用所面临的技术困难。

关 键 词:金刚石薄膜  化学气相沉积  工业应用  制备  性质

Industrial Applications of Chemical Vapor Deposition Diamond Films
Ma Zhibin Wu Qinchong Institute of Plasma Physics,Chinese Academy of Sciences,Hefei, Wang Jianhua.Industrial Applications of Chemical Vapor Deposition Diamond Films[J].Materials Review,2001,15(3):24-27.
Authors:Ma Zhibin Wu Qinchong Institute of Plasma Physics  Chinese Academy of Sciences  Hefei  Wang Jianhua
Affiliation:Ma Zhibin Wu Qinchong Institute of Plasma Physics,Chinese Academy of Sciences,Hefei,230031) Wang Jianhua Department of Material Engineering,Wuhan Chemical Industry College,430073)
Abstract:The methods of preparing diamond films by chemical vapor deposition were reviewed.The prospects of industrial applications of diamond films were discussed and the technological difficulties encountered in large scale applications were analyzed.
Keywords:diamond film  chemical vapor deposition  industrial applications
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