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| Hf:Fe:LN晶体生长与光折变性能的研究 | |
| 引用本文： | 代丽,吴士平,尹红,郭景杰,刘威,苏彦庆,徐玉恒.Hf:Fe:LN晶体生长与光折变性能的研究[J].压电与声光,2009,31(4). |
| 作者姓名： | 代丽 吴士平 尹红 郭景杰 刘威 苏彦庆 徐玉恒 |
| 作者单位： | 1. 哈尔滨工业大学,材料科学与工程学院,黑龙江,哈尔滨,150001;哈尔滨理工大学,应用科学学院,黑龙江,哈尔滨150080 2. 哈尔滨工业大学,材料科学与工程学院,黑龙江,哈尔滨,150001 3. 四川压电与声光技术研究所,重庆,400060 4. 哈尔滨理工大学,应用科学学院,黑龙江,哈尔滨150080 5. 哈尔滨工业大学,应用化学系,黑龙江,哈尔滨,150001 |
| 摘 要： | 原料采用在Fe(0.03%,质量分数):LN中掺进摩尔分数为(1%、2%、4%、5%)的HfO2,再次采用提拉法生长Hf:Fe:LN晶体.抗光损伤阈值测试表明,Hf(5%,摩尔分数):Fe:LN晶体抗光损伤能力比Hf(1%,摩尔分数):Fe:LN晶体提高2个数量级以上.以二波耦合光路测试晶体的衍射效率,写入时间和擦除时间,并计算出光折变灵敏度和动态范围.结果表明,Hf:Fe:LN晶体全息存储性能优于Fe:LN晶体. |
| 关 键 词： | Hf:Fe:LN晶体 红外光谱 衍射效率 动态范围 |
Study on Growth and Photorefractive Properties of Hf:Fe:LN Crystals |
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| DAI Li,WU Shi-ping,YIN Hong,GUO Jing-jie,LIU Wei,SU Yan-qing,XU Yu-heng.Study on Growth and Photorefractive Properties of Hf:Fe:LN Crystals[J].Piezoelectrics & Acoustooptics,2009,31(4). | |
| Authors: | DAI Li WU Shi-ping YIN Hong GUO Jing-jie LIU Wei SU Yan-qing XU Yu-heng |
| Abstract: | Doping with (1%, 2%, 4%, 5%)(in mole) HfO2 in Fe(0.03%):LN, Hf:Fe:LN crystals have been grown by Czochralski method. The optical damage resistance of Hf(5%):Fe:LN crystals is about two orders of magnitude higher than that of Hf(1%):Fe:LN. The diffraction efficiency, writing time and erasure time of crystals were measured by two wave coupling photo-path and the photorefractive sensitivity and dynamic range were calculated. The results show that the holographic storage properties of Hf:Fe:LN crystals are superior to Fe:LN crystals. |
| Keywords: | Hf:Fe:LN crystal infrared spectrum diffraction efficiency dynamic range |
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