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Reactive Magnetron Sputter Deposition of Titanium Oxynitride TiNxOy Coatings: Influence of Substrate Bias Voltage on the Structure,Composition, and Properties |
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| Authors: | Saoula N Bait L Sali S Azibi M Hammouche A Madaoui N |
| Affiliation: | 1.Division Milieux Ionisés et Lasers, Centre de Développement des Technologies Avancées (CDTA), Baba Hassen, BP n 17, Alger, Algeria ;2.Centre de Recherche en Technologie des Semi-conducteurs pour l’Energétique CRTSE–02, Bd. Dr. Frantz Fanon, 16038, Merveilles, Algeria ; |
| Abstract: | Protection of Metals and Physical Chemistry of Surfaces - TiOxNy films were grown onto 316L stainless steel substrate using radiofrequency (rf) magnetron sputtering from a pure titanium nitride... |
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