Influence of substrate temperature on ultraviolet emission of ZnO films prepared by ultrasonic spray pyrolysis |
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Authors: | Mu Hee Choi Tae Young Ma |
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Affiliation: | (1) Department of Electrical Engineering & Research Institute of Computer Information Communication, Gyeongsang National University, Jinju, 660-701, South Korea |
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Abstract: | ![]() ZnO films were deposited on MgO substrates (ZnO/MgO) by ultrasonic spray pyrolysis. Substrate temperature varied from 200 to 350°C. The crystallographic properties and surface morphologies of the ZnO/MgO films were studied by X-ray diffraction and scanning electron microscopy. The properties of photoluminescence (PL) for the films were investigated by dependence of PL spectra on the substrate temperature and the ambient temperature. Ultraviolet (UV) emission peak (3.37 eV) was dominantly detected at 18 K, which sustained at 300 K with a reduced value of the peak energy. The ZnO/MgO films prepared at 350°C showed the strongest UV emission peak at 18 and 300 K among the films in this study. |
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