Sol-gel fabrication of NiO and NiO/WO3 based electrochromic device on ITO and flexible substrate |
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| Affiliation: | 1. Department of Materials Science and Engineering, Seoul National University of Science and Technology, Seoul 01811, Republic of Korea;2. Program of Materials Science & Engineering, Convergence Institute of Biomedical Engineering and Biomaterials, Seoul National University of Science and Technology, Seoul 01811, Republic of Korea;1. Key Laboratory of Bio-Inspired Smart Interfacial Science and Technology of Ministry of Education, School of Chemistry, Beijing Advanced Innovation Center for Biomedical Engineering, Beihang University, Beijing, 100191, PR China;2. School of Physics and Nuclear Energy Engineering, Beihang University, Beijing, 100191, PR China;3. School of Energy and Power Engineering, Beihang University, Beijing, 100191, PR China;1. Laboratory of Advanced Nano Materials and Devices, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201, China;2. Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China;3. Institute of Inorganic Materials, School of Materials Science and Chemical Engineering, Ningbo University, Ningbo 315211, China;4. State Key Laboratory of High Performance Ceramics and Superfine Microstructure, Shanghai Institute of Ceramics, Chinese Academy of Sciences, Shanghai 200050, China;5. Berma Technology (Ningbo) Group Co. LTD, Ningbo 315000, China |
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| Abstract: | Electrochromic devices (ECDs) with reversible transmittance change represent a promising alternative to smart windows. However, the low?cost facile fabrication of ECDs, particularly flexible devices, remains challenging. In this study, novel NiO is synthesized by a solid state method, and the as?prepared NiO is introduced as an electrochromic anodic layer and fabricated onto a transparent conductive electrode (indium tin oxide, ITO or flexible silver nanowires, AgNW) by a sol–gel spin coating and low temperature annealing (80 °C-150 °C). The solvent, thickness of NiO, and annealing temperature are evaluated to obtain higher ECD performance. NiO/ITO ECDs exhibit very high transmittance variation (ΔT = ~84%) at 700 nm with applied potentials of ?3.0 and 0 V. The stability and transmittance variation of NiO/ITO are significantly improved in the presence of a WO3 cathodic electrode at lower applied voltages of 1.5 to 0 V. The low processing temperature of 80 °C demonstrates the potential of the flexible ECDs. The flexible NiO–WO3 device achieves a transmittance variation of ~38% at 700 nm with applied potential of 2.0 and 0 V, and retains the ECD performance. The application of low?cost solution?processed NiO and NiO/WO3?based ECDs in flexible transparent conductive electrodes provides a new pathway for the fabrication of optical devices and printed electronics. |
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| Keywords: | Nickel oxide Tungsten oxide sol?gel coating Flexible electrochromic device |
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