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Optimized allylamine deposition for improved pluripotential cell culture |
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| Authors: | E. Punzó n-Quijorna,V. Sá nchez-Vaquero,A. Muñ oz Noval,D. Gallach Pé rezA. Climent Font,G. CecconeR. Gago,J.P. Garcí a Ruiz,M. Manso Silvá n |
| Affiliation: | a Departamento de Física Aplicada y Departamento de Biología Molecular, Universidad Autónoma de Madrid, Spain b Centro de Microanálisis de Materiales CMAM, Universidad Autónoma de Madrid, Spain c Centro de Investigaciones Biomédicas en Red, Bioingeniería, Biomateriales y Nanomedicina, (CIBER-BBN) Spain d Institute for Health and Consumer Protection, European Commission, Ispra (Va), Italy e Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas, Spain |
| Abstract: | Deposition of allylamine (ALL) by plasma enhanced chemical vapor deposition has been optimized on silicon based models. Simultaneous energy recoil detection analysis and Rutherford backscattering spectra show that 100 W deposition is ideal in terms of polymerized film formation and H content while, lower or higher power induce reduced film retention or excessive cross linking, respectively. Surface composition of the ALL film was further probed by X-ray photoelectron spectroscopy revealing a monocomponent N 1s spectrum compatible with the presence of primary amines. Optimized ALL films were applied to polycaprolactone (PCL) surfaces after Ar plasma activation with implications in the chemistry and wettability of this biocompatible polymer. Human mesenchymal stem cells (hMSCs) were cultured on ALL coated PCL surface and controls. ALL functionalized PCL was found to be especially attractive for the formation of confluent monolayers of hMSCs after 72 h of culture. |
| Keywords: | Allylamine PE-CVD RBS ERDA XPS Polycaprolactone |
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