首页 | 本学科首页   官方微博 | 高级检索  
     

抗辐照SOI256kB只读存储器的ESD设计
引用本文:罗静,颜燕,罗晟,洪根深,胡永强.抗辐照SOI256kB只读存储器的ESD设计[J].电子与封装,2011,11(9):27-31.
作者姓名:罗静  颜燕  罗晟  洪根深  胡永强
作者单位:中国电子科技集团公司第58研究所,江苏无锡,214035
摘    要:ESD设计技术已成为业界提升SOI电路可靠性的一个瓶颈技术。文章介绍了一款具有抗辐照能力、基于SOI/CMOS工艺技术研制的容量为256kB只读存储器电路的ESD设计方案。结合电路特点详细分析了其ESD设计的难点,阐述了从工艺、器件和电路三个方面如何密切配合,进行SOI电路ESD设计的分析思路和解决方法。电路基于0.8...

关 键 词:静电放电  SOI  栅控二极管  只读存储器

ESD Design for Radiation-hardened SOI 256kB Read-only Memory
LUO Jing,YAN Yan,LUO Sheng,HONG Gen-shen,HU Yong-qiang.ESD Design for Radiation-hardened SOI 256kB Read-only Memory[J].Electronics & Packaging,2011,11(9):27-31.
Authors:LUO Jing  YAN Yan  LUO Sheng  HONG Gen-shen  HU Yong-qiang
Affiliation:LUO Jing,YAN Yan,LUO Sheng,HONG Gen-shen,HU Yong-qiang(China Electronics Technology Group Corporation No.58 Research Institute,Wuxi 214035,China)
Abstract:ESD design technology has become a SOI bottleneck technology to enhance the reliability of the SOI circuit. The ESD protection design solution of radiation-hardened 256kB ROM based on SOI/CMOS process is proposed in this paper. Combined with circuit features, detailed analyses for the ESD design difficulties of this chip are proposed in the paper. The analysis and the solving method how to closely cooperate process, components and circuits three aspects for ESD design of SOI circuit are described. Based on 0.8 μ m 1P3M partially-depletion SOI/CMOS process, its HBM ESD level reaches 4kV by using the ESD design methods and networks.
Keywords:ESD  SOI  lubistor  ROM  
本文献已被 CNKI 维普 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号