Improving cure performance of Si3N4 suspension with a high refractive index resin for stereolithography-based additive manufacturing |
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Affiliation: | 1. School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou, 510006, China;2. State Key Laboratory of Advanced Technologies for Comprehensive Utilization of Platinum Metals, Kunming Institute of Precious Metals, Kunming, 650106, China |
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Abstract: | Silicon nitride (Si3N4) slurries with high solid loading, low viscosity and good stability is difficulty prepared, due to low intrinsic surface charge and a large refractive index (RI) difference between Si3N4 powder and resin. In this paper, the curing behavior of Si3N4 slurry with different functional group and RI of resin monomer were systematically researched, and then the kind and optimum content of dispersant were investigated. Subsequently, a high solid loading Si3N4 slurry (44 vol%) with good curing behavior, low viscosity and favorable stability was successfully prepared. Lastly, the dense Si3N4 ceramic parts were fabricated by the suitable Si3N4 slurry (44 vol%) via stereolithography. After debinding and sintering process, the relative density and flexural strength of Si3N4 ceramic were 98.28% and 800 ± 27.28 Mpa, respectively. |
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Keywords: | Resin monomer Dispersion Stereolithography |
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