| 铁电薄膜及其制备技术 |
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| 引用本文： | 王华.铁电薄膜及其制备技术[J].桂林电子科技大学学报,2001,21(2):47-51. |
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| 作者姓名： | 王华 |
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| 作者单位： | 桂林电子工业学院通信与信息工程系, |
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| 摘 要： | 具有铁电性且厚度尺寸为数十纳米到数微米的铁电薄膜具有良好的压电性、热释电性、电光及非线性光学特性 ,在微电子学、光电子学、集成光学和微电子机械系统等领域有着广泛的应用前景 ,是目前国际上新型功能材料研究的热点之一。通过综述铁电薄膜及其制备技术研究的新进展 ,给大家介绍铁电薄膜材料的基本特征、性能及应用 ,并重点分析铁电薄膜主要制备技术的优缺点 ,指出了目前铁电薄膜及其制备技术研究需要重点解决的一些问题。
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| 关 键 词： | 铁电薄膜 制备技术 溅射 脉冲激光沉积 溶胶-凝胶 金属有机物化学气相淀积 |
| 文章编号： | 1001-7437(2001)02-47-05 |
| 修稿时间： | 2001年3月7日 |
Ferroelectric Thin Films and the Related Processing Techniques |
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| WANG Hua.Ferroelectric Thin Films and the Related Processing Techniques[J].Journal of Guilin Institute of Electronic Technology,2001,21(2):47-51. |
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| Authors: | WANG Hua |
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| Abstract: | Ferroelectric thin film is one of the functional material with attractive applied prospects in microelectronics,photoelectronics,integration optics and microelectronic machine system due to its good properties of piezoelectricity,thermoelectricity electrooptic and nonlinear photics.Recent studies on ferroelectric thin films and the related processing techniques are reviewed.The characteristics,the processing techniques,and the application of ferroelectric thin films are described in this paper.The advantages and disadvantages of different processing methods for ferroelectric thin films are discussed.Some key problems are outlined. |
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| Keywords: | ferroelectric thin film processing technology sputtering PLD Sol Gel MOCVD |
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