Fabrication and Characterization of MOVPE-Grown CdTe-on-Si Heterojunction Diode-Type Gamma-Ray Detectors |
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Authors: | M Yokota K Yasuda M Niraula K Nakamura H Ohashi R Tanaka M Omura S Minoura I Shingu Y Agata |
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Affiliation: | (1) Graduate School of Engineering, Nagoya Institute of Technology, Gokiso, Showa, Nagoya 466-8555, Japan |
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Abstract: | We report on the growth of very thick (>260 μm) high-crystalline-quality single-crystal CdTe epitaxial films on (211) Si substrates in a metalorganic vapor-phase epitaxy
reactor, and the development of gamma ray detectors and their radiation detection properties. Films were grown with a high
growth rate varying from 40 μm/h to 70 μm/h. A heterojunction diode was fabricated by growing a 90-μm-thick CdTe layer on an n
+-Si substrate, which exhibited good rectifying behavior and had a low reverse bias leakage current of 0.18 μA/cm2 at 100 V bias. The diode clearly demonstrated its gamma radiation detection capability by resolving energy peaks from the
241Am radioisotope during room-temperature measurements. By cooling the diode detector to −30°C, the leakage current could be
reduced by three orders of magnitude from the room-temperature value. At this operating condition dramatic improvements in
the pulse height spectrum were observed. |
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Keywords: | CdTe epilayers MOVPE Si substrates heterojunction diode radiation detectors |
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