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Prevention of spalling by the self-formed reaction barrier layer on controlled collapse chip connections under bump metallization
Authors:C. Y. Liu  S. J. Wang
Affiliation:(1) Department of Chemical Engineering and Materials Engineering, National Central University, Chung-Li, Taiwan, Republic of China
Abstract:
The spalling phenomenon on under bump metallization (UBM) is one of the current urgent reliability issues for the Pb-free solder implementation in flip chip technology. In this paper, we report that spalling of Ni thin UBM can be prevented during the soldering reaction, if a Cu reservoir is introduced into the structure of controlled collapse chip connections (C4) solder joints. Once molten Sn-3.5Ag solder was saturated with Cu atoms, Cu precipitated out as a layer of Cu-Sn compound on Ni thin UBM. The Cu-Sn compound layer served as a reaction barrier to retard the consumption of Ni thin UBM. So, spalling was retarded. After prolonged reflowing, Ni thin UBM was converted to ternary Cu-Sn-Ni compounds. Unlike interfaces of the Ni-Sn compound/Cr, the interface of the Cu-Sn-Ni compound/Cr was very stable and no spalling was found.
Keywords:Pb-free solder  flip chip  UBM
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