Prevention of spalling by the self-formed reaction barrier layer on controlled collapse chip connections under bump metallization |
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Authors: | C. Y. Liu S. J. Wang |
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Affiliation: | (1) Department of Chemical Engineering and Materials Engineering, National Central University, Chung-Li, Taiwan, Republic of China |
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Abstract: | ![]() The spalling phenomenon on under bump metallization (UBM) is one of the current urgent reliability issues for the Pb-free solder implementation in flip chip technology. In this paper, we report that spalling of Ni thin UBM can be prevented during the soldering reaction, if a Cu reservoir is introduced into the structure of controlled collapse chip connections (C4) solder joints. Once molten Sn-3.5Ag solder was saturated with Cu atoms, Cu precipitated out as a layer of Cu-Sn compound on Ni thin UBM. The Cu-Sn compound layer served as a reaction barrier to retard the consumption of Ni thin UBM. So, spalling was retarded. After prolonged reflowing, Ni thin UBM was converted to ternary Cu-Sn-Ni compounds. Unlike interfaces of the Ni-Sn compound/Cr, the interface of the Cu-Sn-Ni compound/Cr was very stable and no spalling was found. |
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Keywords: | Pb-free solder flip chip UBM |
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