Fundamental investigation of subsurface damage in single crystalline silicon caused by diamond machining |
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Authors: | Jiwang Yan Tooru Asami Hirofumi Harada Tsunemoto Kuriyagawa |
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Affiliation: | aDepartment of Nanomechanics, School of Engineering, Tohoku University, Aramaki Aoba 6-6-01, Aoba-ku, Sendai 980-8579, Japan;bSiltronic Japan Corporation, 3434 Shimata, Hikari, Yamaguchi 743-0063, Japan |
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Abstract: | Single crystalline silicon was plunge-cut using diamond tools at a low speed. Cross-sectional transmission electron microscopy and laser micro-Raman spectroscopy were used to examine the subsurface structure of the machined sample. The results showed that the thickness of the machining-induced amorphous layer strongly depends on the tool rake angle and depth of cut, and fluctuates synchronously with surface waviness. Dislocation activity was observed below the amorphous layers in all instances, where the dislocation density depended on the cutting conditions. The machining pressure was estimated from the micro-cutting forces, and a subsurface damage model was proposed by considering the phase transformation and dislocation behavior of silicon under high-pressure conditions. |
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Keywords: | Single crystal silicon Nano precision cutting Ductile machining Phase transformation Dislocation Subsurface damage High pressure |
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