太阳光谱选择性吸收涂层制备工艺探讨

探讨粘结层、吸收层、减反射层的制备工艺及基底粗糙度状态对太阳选择性吸收涂层性能的影响。采用磁控溅射法,以SS/AlN涂层为例,制备太阳光谱选择性吸收涂层,并测试性能。结果表明：合适的制备工艺可以提高膜层的结合力和涂层的整体性能,胶带粘贴无脱落,吸收比96%,500℃发射比10.5%,并证实基底的粗糙度对涂层的发射率基本无影响。

Discussion on Preparation of Selective Absorption Coating

Studies the effect of the preparation process of adhesive layer, absorbing layer and antireflection layer as well as the substrate roughness condition on the properties of the selective absorption coating. Taking the SS/A1N coating as an example, the selective absorption coating is prepared with magnetron sputtering method. The results show that： the suitable preparation process can improve the adhesion force and properties of the coating. Coating is without loss in the tape pasting experiment. The absorption ratio is 96% and the emission ratio at 500 ℃ is 10.5%. And the research confirms that the substrate roughness has no effect on the emissivity of the coating.