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Simulation of time depending void formation in copper, aluminum and tungsten plugged via structures |
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| Authors: | David Dalleau Kirsten Weide-Zaage Yves Danto |
| Affiliation: | a Laboratorium für Informationstechnologie, Universität Hannover, Germany;b Laboratoire de Microelectronique, IXL, Bordeaux, France |
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