| Crystal structure and electrochemical behaviors of Pt/mischmetal film electrodes |
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| 作者姓名： | 张文魁 杨晓光 马淳安 王云刚 余厉阳 |
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| 作者单位： | [1]DepartmentofAppliedChemistry,ZhejiangUniversityofTechnology,Hangzhou310032,China [2]InstituteofMaterialsandChemicalEngineering,ZhejiangUniversity,Hangzhou310027,China |
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| 基金项目： | Project( 5 99710 46 )supportedbytheNationalNaturalScienceFoundationofChina |
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| 摘 要： | The Ml(La-rich mischmetal0films with a thin Pt layer on the substrate of chemically coarse ITO glass or silicon slices were prepared by magnetic sputtering tchnique.The crystal structure and surface morphology of the films were investigated by X-ray diffraction(XRD)analysis and atomic force microscopy(AFM),respectively, The electrochemical hydridation/dehydridation behaviors of the films in KOH solution were studied by using cyclic voltammagraph and electrochemical impedance spectrum(EIS)as well.The AFM results show that the Pt cover layer on the M1 films is of island structure with a grain of 150-200nm in size.The presence of a thin Pt layer can provide sufficient high electrocatalytic activity for the electrochemical charge-transfer reaction.The electrochemical reduction and oxidation reaction occur on the Pt layer,and the diffusion of H into the Ml film is the rate-controlled step.The Pt coatings also act as protective layers,preventing oxidation and/or poisoning of the underlying Ml films in air.
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| 关 键 词： | 稀土薄膜 电化学行为 晶体结构 铂/含铈稀土合金 电极 储氢合金 |
Crystal structure and electrochemical behaviors of Pt/mischmetal film electrodes |
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| ZHANG Wen-kui ,YANG Xiao-guang ,MA Chun-an ,WANG Yun-gang ,YU Li-yang.Crystal structure and electrochemical behaviors of Pt/mischmetal film electrodes[J].Transactions of Nonferrous Metals Society of China,2003,13(1):20-24. |
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| Authors: | ZHANG Wen-kui YANG Xiao-guang MA Chun-an WANG Yun-gang YU Li-yang |
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| Affiliation: | ZHANG Wen-kui 1,YANG Xiao-guang 2,MA Chun-an 1,WANG Yun-gang 1,YU Li-yang 2 |
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| Abstract: | The Ml(La-rich mischmetal) films with a thin Pt layer on the substrate of chemically coarsen ITO glass or silicon slices were prepared by magnetic sputtering technique. The crystal structure and surface morphology of the films were investigated by X-ray diffraction(XRD) analysis and atomic force microscopy(AFM), respectively. The electrochemical hydridation/dehydridation behaviors of the films in KOH solution were studied by using cyclic voltammagraph and electrochemical impedance spectrum(EIS) as well. The AFM results show that the Pt cover layer on the Ml films is of island structure with a grain of 150200 nm in size. The presence of a thin Pt layer can provide sufficient high electrocatalytic activity for the electrochemical charge-transfer reaction. The electrochemical reduction and oxidation reaction occur on the Pt layer, and the diffusion of H into the Ml film is the rate-controlled step. The Pt coatings also act as protective layers, preventing oxidation and/or poisoning of the underlying Ml films in air. |
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| Keywords: | rare earth films electrochemical behaviors cyclic voltamagraph |
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