| 紫外纳米压印用PMMA转移层膜的制备及性能 |
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| 引用本文： | 董会杰,辛忠,陆馨.紫外纳米压印用PMMA转移层膜的制备及性能[J].微纳电子技术,2009,46(9). |
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| 作者姓名： | 董会杰 辛忠 陆馨 |
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| 作者单位： | 华东理工大学化学工程联合国家重点实验室,上海,200237 |
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| 基金项目： | 上海市科委纳米技术专项资助课题 |
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| 摘 要： | 以苯甲醚为溶剂,采用旋涂法制备PMMA(聚甲基丙烯酸甲酯)转移层膜。当PMMA的质量分数为5%、旋涂速度为2000～6000r/min时,转移层膜的厚度为90～150nm,粗糙度为0.3nm,可满足纳米压印要求。采用接触角测量仪测试计算出PMMA、PS转移层膜的表面能,并通过转移层膜与压印胶之间的粘附功和界面张力的计算,评价了PMMA、PS和Si片对压印胶的润湿和粘附性能。结果表明,PMMA膜可改善压印胶在基片上的润湿铺展性能和粘附性能,而PS膜虽能改善基片的润湿铺展性能,却不利于压印胶的粘附。
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| 关 键 词： | 紫外纳米压印 聚甲基丙烯酸甲酯 转移层膜 压印胶 粘附功 |
Preparation and Properties of PMMA Films For Ultraviolet Nanoimprint Lithography Transfer Layers |
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| Dong Huijie,Xin Zhong,Lu Xin.Preparation and Properties of PMMA Films For Ultraviolet Nanoimprint Lithography Transfer Layers[J].Micronanoelectronic Technology,2009,46(9). |
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| Authors: | Dong Huijie Xin Zhong Lu Xin |
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| Affiliation: | Dong Huijie,Xin Zhong,Lu Xin(State Key Laboratory of Chemical Engineering,East China University ofScience , Technology,Shanghai 200237,China) |
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| Abstract: | The polymethy lmethacrylate(PMMA) transfer layer was prepared by spin-coating method with anisole as a solvent.The spin coating of 90-150 nm thick PMMA films for the ultraviolet imprint lithography was examined with 5% mass fraction of PMMA and 2 000-6 000 r/min spin speed,the 0.3 nm roughness of PMMA transfer layer was achieved.The surface energies of PMMA and PS films were characterized by contact angle instrument.The relationship of polar and dispersive parts between the transfer layer and UV-NIL resist ... |
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| Keywords: | ultraviolet nanoimprint lithography PMMA transfer layer resist adhesion work |
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